質量比混合法標準ガス Gravimatric Mixture Standard Gases

针对离子注入装置、我社敬备以下主要气体。

We supply the following gases for ion implantation:

以下气体以外,特殊的材料、流体、固体也可根据要求配制。

We also supply special materials not listed below, and materials in liquid or solid forms upon request.

高千穂所制造离子注入装置用气体一览表
Table of Ion Implantation Gases Manufactured at Takachiho

容器种类
Cylinder Size
气体的种类
Gas or Mixture
充填压力
Filling Pressure
容量
Contents
容器阀门形状
Valve Type
出口 尺寸
Outlet Size
0.35L AsH3 15%+H2 4.91MPa 17.5L  隔膜阀
直通式(SUS)
Diaphragm Valve
Straight Type   
1/4PF
(阳) 19旋
19h male
PH3 15%+H2 4.91MPa 17.5L 
PH3 15%+He 4.91MPa 17.5L 
BF3 7.36MPa 100g
SiF4 4.91MPa 100g
Ar 4.91MPa 17.5L
1L AsH3 15%+H2 4.91MPa 50L 隔膜阀
角式(SUS)
Diaphragm Valve
Angle Type
22mm
(阳) 左14旋
14h left male

22mm 14
(阳) 右14旋
14h right male
PH3 15%+H2 4.91MPa 50L
BF3 5.40MPa 200g
11BF3 2.95MPa 100g
Ar 4.91MPa 50L 杆式阀
角式
Spindle Valve
Angle Type
3.4L AsH3 15%+H2 4.91MPa 170L 隔膜阀
直通式(B)
Diaphragm Valve
Angle Type
22mm
(阳) 左14旋
14h left male

22mm
(阳) 右14旋
14h right male
PH3 15%+H2 4.91MPa 170L
BF3 2.75MPa 300g 隔膜阀
角式(SUS
Diaphragm Valve
Angle Type
11BF3 1.97MPa 200g
Ar 4.91MPa 170L 杆式阀
(内蔵过滤器)
Spindle Valve
Angle Type
22mm
(阳) 右14旋
14h right male
其他的
气体材料
Others
BCL3, Xe, Ne, O2, PF3, N2, CO2, B2H6 15%+H2, GeH4, AsH3, PH3
SDS® AsH3 100% 21℃
650±50Torr
4×440g
7×88g
隔膜式
(内蔵过滤器)
Diaphragm
(Internal Filter)
(阳) 1/2"VCR
1/2"VCR male
PH3 100% 4×170g
7×30g
11BF3 100% 4×130g
7×26g
(阳)1/4"VCR
1/4"VCR male

注释) SDS 4X=2.25L SDS 7X=0.44L容器。
Note) SDS 4X = 2.25L, SDS 7X = 0.44L cylinder.
SDS是MATHESON TRI・GAS和Advanced Technology Materials, Inc.的注册商标。
SDS is a registered trade mark of MATHESON TRI・GAS and Advanced Technology Materials, Inc.

以上的气体以外,也请询问。注释) SDS 4X=2.25L SDS 7X=0.44L容器。
Please inquire about other gases not listed above


离子注入相关装置

Ion Implantation Related Services

  1. 也进行气体管道铺设的工程、改造工程、容器装设工作和管理。
  2. 也办理特殊配管和认定零部件。
  3. 为了确保您的安全,对0.35L、1L尺寸的容器,我们提供如右下边照片图的专用盒子。
  1. We install gas piping and tubings, perform alterations, cylinder changes, and maintenance.
  2. We also accept special piping and tubing requests, and carry regulatory certified parts.
  3. For your safety, we provide our 0. 35L and 1L cylinders in special boxes as seen in the picture on the right.


 


使用离子注入装置材料气体的注意事项。

Notes on using ion implantation gases

  1. 至于离子注入装置所使用的材料气体,多属毒性,腐蚀性,可燃性气体,必需事先充分掌握气体的特殊性以及紧急时刻的对应措施。
    请参考"物质安全数据表(MSDS)。
  2. 请准备好空气面具等保护呼吸的器具。
  3. 请务必安装所有必要的检漏仪。
  4. 离子注入装置所使用的特殊气体多数具有高度毒性,必需具备废气装置。
  5. 离子注入装置通常要求高真空。被使用的气体不管是高压气体,还是其他气体,都需要真空检漏测验,和加压检漏测验的双项测验。
  6. 请使用氦气检漏仪进行真空测试。压力检测请使用N2或其他惰性气体,并且确认各连接部的密封性。
  7. 每日检查压力调整器的刻度的减少,以及进行泄漏检查,包括检漏放置测验和检查压力调整器表的变动。
  1. Material gas used for ion implantation is commonly poisonous, corrosive, and flammable.
    A thorough knowledge of the gases’ characteristics and emergency care are needed before use. Please refer to the appropriate Material Safety Data Sheet for details.
  2. Please have air masks and other breathing protection apparatus ready at all times.
  3. Please be sure to install all the necessary leak detectors.
  4. Gas treatment and abatement systems are necessary due to the highly poisonous nature of most ion implantation gases.
  5. Ion implantation equipment normally requires high vacuum. Regardless of the pressure of gases used (be it high pressure or atmospheric pressure), leak test of both types―vacuum test and pressure test―are necessary.
  6. Please use helium leak detector for vacuum tests. Please use N2 or other inert gases for pressure tests, and confirm air tightness of all connections and joints.
  7. Daily readings of regulator gauges, and regulator performance checks including leak tests and gauge performance tests are very important.

Copyright (C) TAKACHIHO TRADING CO.,LTD.
Copyright (C) TAKACHIHO CHEMICAL INDUSTRIAL CO.,LTD.